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RIS citation export for WEPIK106: Impedance and Collective Effects for the Advanced Light Source Upgrade at LBNL

TY - CONF
AU - Persichelli, S.
AU - Byrd, J.M.
AU - De Santis, S.
AU - Li, D.
AU - Luo, T.H.
AU - Steier, C.
AU - Venturini, M.
ED - Schaa, Volker RW
ED - Arduini, Gianluigi
ED - Pranke, Juliana
ED - Seidel, Mike
ED - Lindroos, Mats
TI - Impedance and Collective Effects for the Advanced Light Source Upgrade at LBNL
J2 - Proc. of IPAC2017, Copenhagen, Denmark, 14–19 May, 2017
C1 - Copenhagen, Denmark
T2 - International Particle Accelerator Conference
T3 - 8
LA - english
AB - The upgrade of the Advanced Light Source (ALS-U) consists of a multiband achromat ultralow emittance lattice for the production of diffraction-limited soft x-rays. A very important issue for ALS-U is represented by instabilities induced by wakefields, that may limit the peak current of individual bunches and the total beam current. In addition, vacuum chamber apertures of few millimeters, that are a key feature of low-emittance machines, can result in a significant increase in the Resistive Wall (RW) impedance. In this paper we present progress on establishing short range wakefield model for ALS-U and evaluating the impact on the longitudinal and transverse single-bunch dynamics.
PB - JACoW
CP - Geneva, Switzerland
SP - 3192
EP - 3195
KW - impedance
KW - simulation
KW - wakefield
KW - cavity
KW - vacuum
DA - 2017/05
PY - 2017
SN - 978-3-95450-182-3
DO - 10.18429/JACoW-IPAC2017-WEPIK106
UR - http://jacow.org/ipac2017/papers/wepik106.pdf
ER -