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https://doi.org/10.18429/JACoW-SRF2019-MOP014
Title Electroplating of Sn Film on Nb Substrate for Generating Nb₃Sn Thin Films and Post Laser Annealing
Authors
  • Z. Sun, M. Liepe, T.E. Oseroff, R.D. Porter
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • T. Arias, A.B. Connolly, J.M. Scholtz, N. Sitaraman, M.O. Thompson
    Cornell University, Ithaca, New York, USA
  • X. Deng
    University of Virginia, Charlottesville, Virginia, USA
  • K.D. Dobson
    University of Delaware, Newark, Delaware, USA
Abstract Controlling film quality of Nb₃Sn is critical to its SRF cavity performance. The state-of-the-art vapor diffusion approach for Nb₃Sn deposition observed surface roughness, thin grain regions, and misfit dislocations which negatively affect the RF performance. The Sn deficiency and non-uniformity at the nucleation stage of vapor deposition is believed to be the fundamental reason to cause these roughness and defects issues. Thus, we propose to pre-deposit a uniform Sn film on the Nb substrate, which is able to provide sufficient Sn source during the following heat treatment for Nb₃Sn nucleation and growth. Here, we demonstrated successful electrodeposition of a low-roughness, dendrite-free, excellent-adhesion Sn film on the Nb substrate. More importantly, we further achieved a uniform, low-roughness (Ra = 66 nm), pure-stoichiometric Nb₃Sn film through thermal treatment of this electroplated Sn film in the furnace. Additionally, we provide preliminary results of laser annealing as a post treatment for epitaxial grain growth and roughness reduction.
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Conference SRF2019
Series International Conference on RF Superconductivity (19th)
Location Dresden, Germany
Date 30 June-05 July 2019
Publisher JACoW Publishing, Geneva, Switzerland
Editorial Board Peter Michel (HZDR, Dresden, Germany); André Arnold (HZDR, Dresden, Germany); Volker RW Schaa (GSI, Darmstadt, Germany)
Online ISBN 978-3-95450-211-0
Online ISSN ""
Received 22 June 2019
Accepted 30 June 2019
Issue Date 14 August 2019
DOI doi:10.18429/JACoW-SRF2019-MOP014
Pages 51-54
Copyright
Creative Commons CC logoPublished by JACoW Publishing under the terms of the Creative Commons Attribution 3.0 International license. Any further distribution of this work must maintain attribution to the author(s), the published article's title, publisher, and DOI.