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URLhttps://doi.org/10.18429/JACoW-IPAC2024-WEPS39
TitleV₃Si: an alternative thin film material for superconducting RF cavities
Authors
  • C. Benjamin, D. Seal, G. Stenning, J. Conlon, O. Malyshev, R. Valizadeh
    Science and Technology Facilities Council
AbstractSuperconducting materials, like V3Si, NbN, NbTiN and Nb3Sn, are potential alternatives to Nb for next generation thin film SRF cavities. In comparison to the Nb, their relatively high Tc could allow for operation at higher temperatures (≥ 4 K) and the higher critical field could lead to for higher accelerating gradients. We investigate optimum deposition parameters and substrates for V3Si, using single target physical vapor deposition (PVD). We report on the superconducting properties such as Tc and surface resistance using RRR and low power RF, stoichiometry using RBS, SIMS, XPS and EDX and surface quality using AFM and white light interferometry.
Paperdownload: WEPS39.pdf
CiteBibTeX, LaTeX, Text/Word, RIS, EndNote
Conference15th International Particle Accelerator Conference
Series
LocationNashville, TN
Date19-24 May 2024
PublisherJACoW Publishing, Geneva, Switzerland
Editorial BoardFulvia Pilat - Oak Ridge National Laboratory Wolfram Fischer - Brookhaven National Laboratory Robert Saethre - Oak Ridge National Laboratory Petr Anisimov - Los Alamos National Laboratory Ivan Andrian - Elettra-Sincrotrone Trieste S.C.p.A.
Online ISBN978-3-95450-247-9
Online ISSN2673-5490
Received15 May 2024
Revised19 May 2024
Accepted23 May 2024
Issued01 July 2024
DOI10.18429/JACoW-IPAC2024-WEPS39
Pages2779-2781