JACoW is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.
TY - CONF AU - Gaitan, G. AU - Holic, A.T. AU - Howes, W.I. AU - Kulina, G. AU - Liepe, M. AU - Quigley, P. AU - Sears, J. AU - Sun, Z. AU - Wendland, B.W. ED - Saito, Kenji ED - Xu, Ting ED - Sakamoto, Naruhiko ED - Schaa, Volker R.W. ED - Thomas, Paul W. TI - Development of a Plasma-Enhanced Chemical Vapor Deposition System for High-Performance SRF Cavities J2 - Proc. of SRF2023, Grand Rapids, MI, USA, 25-30 June 2023 CY - Grand Rapids, MI, USA T2 - International Conference on RF Superconductivity T3 - 21 LA - english AB - Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, or other compound superconductors are essential for reaching enhanced RF performance levels in SRF cavities. However, optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a high-vacuum, gas, and precursor delivery system, and uses plasma to significantly reduce the required processing temperature and promote precursor decomposition. Here we present an update on the development of this system, including final system design, safety considerations, assembly, and commissioning. PB - JACoW Publishing CP - Geneva, Switzerland SP - 100 EP - 103 KW - cavity KW - SRF KW - plasma KW - vacuum KW - controls DA - 2023/09 PY - 2023 SN - 2673-5504 SN - 978-3-95450-234-9 DO - doi:10.18429/JACoW-SRF2023-MOPMB015 UR - https://jacow.org/srf2023/papers/mopmb015.pdf ER -